Menu
Home
Forums
New posts
Search forums
What's new
Featured content
New posts
New media
New media comments
New resources
Latest activity
Media
New media
New comments
Search media
Resources
Latest reviews
Search resources
Log in
Register
What's new
Search
Search
Search titles only
By:
New posts
Search forums
Menu
Log in
Register
Install the app
Install
Home
Forums
Labrish
Nyuuz
High‑NA EUV Shows Promise for Cutting Multi‑Mask Costs
JavaScript is disabled. For a better experience, please enable JavaScript in your browser before proceeding.
You are using an out of date browser. It may not display this or other websites correctly.
You should upgrade or use an
alternative browser
.
Reply to thread
Message
[QUOTE="Munyaradzi Mafaro, post: 33585, member: 636"] New chip-making equipment costs $380 million but might save money overall. IBM researchers showed that High-NA equipment costs 2.5 times more per exposure than standard machines. These savings appear when the technology replaces complex multi-step processes. SemiAnalysis changed its prediction after seeing the new data from February tests. The research confirms that standard double patterning remains cheapest for simple patterns. The math changes when manufacturers need three or more exposures with standard equipment. One high-NA pass can cut total wafer costs almost in half compared to traditional four-mask methods. Factories like fewer exposures because they simplify production steps, reduce waiting time, and decrease error chances. However, not every layer benefits from the expensive new system. Only certain metal layers in Intel 14A chips make financial sense for high-NA use. Intel stands alone among major chipmakers with plans for high-NA production. Equipment maker ASML is working on larger masks to improve speed and efficiency. Chip companies must consider many factors before investing in the technology. Intel has already processed 30,000 test wafers using ASML Twinscan EXE:5000 high-NA systems. Final results about high-NA practicality will come once Intel moves to full production. [/QUOTE]
Insert quotes…
Name
Post reply
Home
Forums
Labrish
Nyuuz
High‑NA EUV Shows Promise for Cutting Multi‑Mask Costs
This site uses cookies to help personalise content, tailor your experience and to keep you logged in if you register.
By continuing to use this site, you are consenting to our use of cookies.
Accept
Learn more…
Top