Researchers at Zhejiang University in Hangzhou have created China's first commercial electron beam lithography machine. The device, named Xizhi, represents a significant advancement for the country's semiconductor manufacturing sector. Chinese scientists achieved this breakthrough despite facing restrictions on accessing advanced Western lithography equipment from companies like ASML. The machine demonstrates precision capabilities reaching 0.6 nanometers, which approaches the specifications of high-end European tools. However, the technology suffers from severe throughput limitations that prevent commercial viability.
The electron beam approach requires point-by-point wafer processing, which extends production times to several hours...